4.5 Article

A phosphine complex of copper (I) bromide as single-source precursor for the aerosol-assisted chemical vapour deposition of phosphide

Journal

INORGANICA CHIMICA ACTA
Volume 362, Issue 9, Pages 3069-3072

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.ica.2009.01.031

Keywords

Copper phosphide; X-ray structure; Thin film; CVD

Ask authors/readers for more resources

A new homobimetallic complex [Cu-2(tpp)(2)(dppm)Br-2] (1) of copper(I) bromide with triphenylphosphine (tpp) and bis-diphenylphosphinomethane (dppm) has been synthesized and charaterized by m.p., elemental analysis, FT-IR, H-1 NMR, mass spectrometry, thermal studies and single crystal X-ray analysis. The solid-state molecular structure of 1, belonging to the monoclinic crystal system with space group P2(1)/n, describes it as a neutral dinuclear species in which two copper atoms are bridged together through two bromides and a dppm ligand and each copper atom possesses a distorted tetrahedral geometry. Complex 1 was studied as a single-source precursor for the fabrication of phase pure thin films of Cu3P by aerosol-assisted chemical vapour deposition. The films have been characterized by PXRD, SEM and ED-XRF analyses and found to exhibit the particles size range 200-400 nm with high purity and surface uniformity. (C) 2009 Elsevier B.V. All rights reserved.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.5
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available