Mixed phase silicon thin films grown at high rate using 60MHz assisted VHF-PECVD technique

Published 2015 View Full Article

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Title
Mixed phase silicon thin films grown at high rate using 60MHz assisted VHF-PECVD technique
Authors
Keywords
Thin films, Plasma deposition, Atomic force microscopy (AFM), Raman spectroscopy and scattering
Journal
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Volume 40, Issue -, Pages 11-19
Publisher
Elsevier BV
Online
2015-07-02
DOI
10.1016/j.mssp.2015.06.046

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