Journal
MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS
Volume 18, Issue 2, Pages 347-352Publisher
UNIV FED SAO CARLOS, DEPT ENGENHARIA MATERIALS
DOI: 10.1590/1516-1439.313914
Keywords
titanium nitride; cathodic cage; titanium dioxide; thin films and hollow cathode
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Thin nitride and titanium dioxide films were produced using an innovative technique called cathodic cage depositon. Uniformity, three-dimensionality and high rate deposition are some of the advantages of this technique. In this study we discuss the influences of temperature, treatment time and gaseous atmosphere on the characteristics of the deposited films. The TiN (titanium nitride) and TiO2 (titanium dioxide) films were produced using a high deposition rate of 2,5 mu m/h at a work temperature and pressure of 400 degrees C and 150 Pa respectively. EDS technique was used to identify the chemical composition of the thin film deposited, whilst Raman spectroscopy indicated the phases present confirmed by DRX analysis. The thickness of the deposited films was studied using electron microscopy scanning. The results based on the deposition parameters confirm the great efficiency and versatility of this technique, which allows a uniform three-dimensional film deposition on any material without the appearance of stress. Compared to other techniques, cathodic cage deposition enables deposition at lower temperatures and higher pressures.
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