Generation of micro inductively coupled plasma on a chip

Inductively coupled plasma (ICP) sources are of great importance for wide range of applications, including but not limited to micro and nanofabrication, chemical analysis, and plasma processing. Portable and battery-operated instruments can be developed using a miniaturized micro ICP chip considering the low-power and low-voltage requirements of micro ICPs. To the best of authors' knowledge, this is the first report for generation of a micro ICP on a chip with size of nearly I mm using a planar coil with diameter of 800 mu m. This chip is capable of producing stable ICPs at the power of 1 W, frequency of 900 MHz, and pressure of 1 torr of helium.