Journal
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
Volume 60, Issue 2, Pages 983-987Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TNS.2012.2232939
Keywords
Electron-beam evaporation; hard X-ray microtomography; high attenuation; microstructured scintillator; spatial resolution; thin film
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A new structured scintillator was developed that will stop significantly more of the incident X-rays without sacrificing spatial resolution. We have recently demonstrated that it is possible to deposit Lu2O3:Eu in a microcolumnar form using electron beam (e-beam) physical vapor deposition (EBPVD) technique. This new structured Lu2O3:Eu scintillator can have a huge impact on X-ray imaging applications including medical imaging, nondestructive testing and hard X-ray microtomography (XMT). Thin film fabrication of Lu2O3 doped with 5% europium was carried out by means of EBPVD. Uniform and stoichiometrically balanced films several microns thick were grown on various kinds of substrates. Their morphology was studied by scanning electron microscopy (SEM) and X-ray diffraction (XRD). Scintillation decay, afterglow, spatial resolution and light conversion efficiency were analyzed. A selected set of films was integrated into position-sensitive detection systems to determine their efficacy for synchrotron and laboratory X-ray source-based high-resolution microtomography.
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