Fabrication of an UltraLow-Resistance Ohmic Contact to MWCNT–Metal Interconnect Using Graphitic Carbon by Electron Beam-Induced Deposition (EBID)

Published 2012 View Full Article

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Title
Fabrication of an UltraLow-Resistance Ohmic Contact to MWCNT–Metal Interconnect Using Graphitic Carbon by Electron Beam-Induced Deposition (EBID)
Authors
Keywords
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Journal
IEEE TRANSACTIONS ON NANOTECHNOLOGY
Volume 11, Issue 6, Pages 1223-1230
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Online
2012-10-05
DOI
10.1109/tnano.2012.2220377

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