In situ Al-doped ZnO films by atomic layer deposition with an interrupted flow

Published 2015 View Full Article

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Title
In situ Al-doped ZnO films by atomic layer deposition with an interrupted flow
Authors
Keywords
Thin films, X-ray scattering, Electrical conductivity, Hall effect
Journal
MATERIALS CHEMISTRY AND PHYSICS
Volume 165, Issue -, Pages 245-252
Publisher
Elsevier BV
Online
2015-09-27
DOI
10.1016/j.matchemphys.2015.09.024

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