Journal
IEEE TRANSACTIONS ON MAGNETICS
Volume 44, Issue 11, Pages 3969-3972Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TMAG.2008.2002865
Keywords
Co-Pt; cobalt alloys; electroplating; microelectromechanical systems (MEMS); permanent magnet array
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Photolithographically-defined patterned arrays of Co-rich Co-Pt permanent magnets with thicknesses up to 10 mu m were fabricated by aqueous electrodeposition. These micromagnets exhibited strong perpendicular magnetic performance while being deposited at low temperatures (65 degrees C) and without the need for post-deposition annealing. Co-Pt magnet arrays grown 10-mu m thick on textured Cu (111) seed layers on Si (110) substrates exhibited coercivities of 330 kA/m (4.1 kOe) and energy products 69 kJ/m(3). Additionally, magnets deposited 8-mu m thick on untextured Cu seed layers on standard Si (100) substrates exhibited coercivities up to 260 kA/m (3.3 kOe) and energy products up to 27 kJ/m(3). The high magnetic performance and process integrability of these permanent magnet arrays make them well suited for the development of magnetic microclectromechanical systems (MEMS).
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