4.6 Article

Single-Crystalline Si STacked ARray (STAR) NAND Flash Memory

Journal

IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 58, Issue 4, Pages 1006-1014

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2011.2107557

Keywords

Damascene gate process; layer replacement and single-crystal Si nanowire; NAND Flash memory; stacked bit lines; three-dimensional (3-D) memory

Funding

  1. Ministry of Knowledge Economy/Korea Evaluation Institute of Industrial Technology [10035320]
  2. Korea Evaluation Institute of Industrial Technology (KEIT) [10035320] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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In this paper, a 3-D NAND Flash memory array having multiple single-crystal Si nanowires is investigated. Device structure and fabrication process are described including the electrical isolation of stacked nanowires. Numerical simulation results focused on NAND Flash memory operation are delivered. Devices and array with stacked bit lines are fabricated, and memory characteristics such as program/erase select gate operation are measured. Array scheme is also discussed for the high-density bit-cost scalable 3-D stacked bit-line NAND Flash memory application.

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