The mechanism of formation of microneedles on the silicon surface in fluorinated plasma via the cyclic etching-deposition process

Published 2008 View Full Article

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Title
The mechanism of formation of microneedles on the silicon surface in fluorinated plasma via the cyclic etching-deposition process
Authors
Keywords
-
Journal
HIGH ENERGY CHEMISTRY
Volume 42, Issue 5, Pages 399-403
Publisher
Pleiades Publishing Ltd
Online
2008-09-25
DOI
10.1134/s0018143908050111

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