Ozone-Based Metal Oxide Atomic Layer Deposition: Impact of N[sub 2]/O[sub 2] Supply Ratio in Ozone Generation

The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2Thin Films

(2009) Seok-Jun Won et al.   CHEMISTRY OF MATERIALS

Plasma-Enhanced Atomic Layer Deposition of TiO[sub 2] and Al-Doped TiO[sub 2] Films Using N[sub 2]O and O[sub 2] Reactants

(2009) Gyu-Jin Choi et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

H[sub 2]O- and O[sub 3]-Based Atomic Layer Deposition of High-κ Dielectric Films on GeO[sub 2] Passivation Layers

(2009) A. Delabie et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics

(2008) Bongki Lee et al.   APPLIED PHYSICS LETTERS

Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry

(2008) David N. Goldstein et al.   Journal of Physical Chemistry C

HfO[sub 2] Atomic Layer Deposition Using HfCl[sub 4]∕H[sub 2]O: The First Reaction Cycle

(2008) L. Nyns et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY