The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2Thin Films

标题
The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2Thin Films
作者
关键词
-
出版物
CHEMISTRY OF MATERIALS
Volume 21, Issue 19, Pages 4374-4379
出版商
American Chemical Society (ACS)
发表日期
2009-09-19
DOI
10.1021/cm9005234

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