The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
出版年份 2015 全文链接
标题
The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
作者
关键词
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出版物
JOURNAL OF CHEMICAL PHYSICS
Volume 143, Issue 16, Pages 164711
出版商
AIP Publishing
发表日期
2015-10-30
DOI
10.1063/1.4934656
参考文献
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