4.6 Article

Excellent resistive switching in nitrogen-doped Ge2Sb2Te5 devices for field-programmable gate array configurations

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APPLIED PHYSICS LETTERS
卷 99, 期 19, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.3659692

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  1. National Research Foundation of Korea (NRF)
  2. Korea government (MEST) [2011-0018646]
  3. Ministry on Knowledge Economy
  4. Center for Distributed Sensor Network in GIST

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The nitrogen-doped Ge2Sb2Te5 (GST) programmable metallization cell is investigated to address the low switching voltage and need for a high resistance ratio, which are critical issues for the filed-programmable gate array (FPGA) configuration. Nitrogen doping of GST yields Ge-N covalent bonds, as confirmed by x-ray photoelectron spectroscopy and Raman spectroscopy; this increases the resistivity of GST. Consequently, an excellent resistance ratio (similar to 10(7)) with appropriate operating voltage and stable retention properties more than for 10(4) s at 85 degrees C are achieved. The results indicate that the film is a suitable alternative candidate for the logic switch in static-random-access-memory-based FPGA technology. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3659692]

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