Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing

标题
Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing
作者
关键词
-
出版物
ADVANCED FUNCTIONAL MATERIALS
Volume 22, Issue 14, Pages 2927-2938
出版商
Wiley
发表日期
2012-04-12
DOI
10.1002/adfm.201102455

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