Design of CMOS Compatible, High-Speed, Highly-Stable Complementary Switching with Multilevel Operation in 3D Vertically Stacked Novel HfO2 /Al2 O3 /TiO x (HAT) RRAM

标题
Design of CMOS Compatible, High-Speed, Highly-Stable Complementary Switching with Multilevel Operation in 3D Vertically Stacked Novel HfO2 /Al2 O3 /TiO x (HAT) RRAM
作者
关键词
-
出版物
Advanced Electronic Materials
Volume 4, Issue 2, Pages 1700561
出版商
Wiley
发表日期
2018-01-10
DOI
10.1002/aelm.201700561

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