The impact of post-deposition annealing on the performance of solution-processed single layer In2O3 and isotype In2O3/ZnO heterojunction transistors

标题
The impact of post-deposition annealing on the performance of solution-processed single layer In2O3 and isotype In2O3/ZnO heterojunction transistors
作者
关键词
-
出版物
Journal of Materials Chemistry C
Volume 5, Issue 1, Pages 59-64
出版商
Royal Society of Chemistry (RSC)
发表日期
2016-12-15
DOI
10.1039/c6tc04907a

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