Simulation and optical spectroscopy of a DC discharge in a CH4/H2/N2 mixture during deposition of nanostructured carbon films
出版年份 2017 全文链接
标题
Simulation and optical spectroscopy of a DC discharge in a CH4/H2/N2 mixture during deposition of nanostructured carbon films
作者
关键词
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出版物
PLASMA PHYSICS REPORTS
Volume 43, Issue 8, Pages 844-857
出版商
Pleiades Publishing Ltd
发表日期
2017-10-25
DOI
10.1134/s1063780x17080098
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注意:仅列出部分参考文献,下载原文获取全部文献信息。- Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH4/N2/H2 Plasmas
- (2016) Benjamin S. Truscott et al. JOURNAL OF PHYSICAL CHEMISTRY A
- Self-assembled nanoparticle patterns on carbon nanowall surfaces
- (2016) N. V. Suetin et al. PHYSICAL CHEMISTRY CHEMICAL PHYSICS
- Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. I. N2/H2 and NH3/H2 Plasmas
- (2015) Benjamin S. Truscott et al. JOURNAL OF PHYSICAL CHEMISTRY A
- Etching of carbon nanowalls during synthesis in the plasma of direct current discharge
- (2015) K. V. Mironovich et al. TECHNICAL PHYSICS LETTERS
- Tailoring of the carbon nanowall microstructure by sharp variation of plasma radical composition
- (2014) Kirill V. Mironovich et al. PHYSICAL CHEMISTRY CHEMICAL PHYSICS
- Growth-rate Enhancement of High-quality, Low-loss CVD-produced Diamond Disks Grown for Microwave Windows Application
- (2013) Sergey Bogdanov et al. CHEMICAL VAPOR DEPOSITION
- Electron impact excitation of methane: determination of appearance energies for dissociation products
- (2013) M Danko et al. JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS
- Carbon nanowalls: the next step for physical manifestation of the black body coating
- (2013) V. A. Krivchenko et al. Scientific Reports
- Optical Emission from Microwave Activated C/H/O Gas Mixtures for Diamond Chemical Vapor Deposition
- (2012) James C. Richley et al. JOURNAL OF PHYSICAL CHEMISTRY A
- Exploring the Plasma Chemistry in Microwave Chemical Vapor Deposition of Diamond from C/H/O Gas Mixtures
- (2012) Mark W. Kelly et al. JOURNAL OF PHYSICAL CHEMISTRY A
- Evolution of carbon film structure during its catalyst-free growth in the plasma of direct current glow discharge
- (2011) V.A. Krivchenko et al. CARBON
- Ultrananocrystalline diamond film deposition by direct-current plasma assisted chemical vapor deposition using hydrogen-rich precursor gas in the absence of the positive column
- (2011) Hak-Joo Lee et al. JOURNAL OF APPLIED PHYSICS
- Quantum cascade laser investigations of CH4 and C2H2 interconversion in hydrocarbon/H2 gas mixtures during microwave plasma enhanced chemical vapor deposition of diamond
- (2009) Jie Ma et al. JOURNAL OF APPLIED PHYSICS
- Basic molecular processes for hydrocarbon spectroscopy in fusion edge plasmas: vibrationally state-selective excitation ofA 2Δ,B 2Σ−andC 2Σ+states of CH by electron impact
- (2009) R Celiberto et al. PLASMA PHYSICS AND CONTROLLED FUSION
- Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures
- (2008) Yuri A. Mankelevich et al. JOURNAL OF APPLIED PHYSICS
- From Ultrananocrystalline Diamond to Single Crystal Diamond Growth in Hot Filament and Microwave Plasma-Enhanced CVD Reactors: a Unified Model for Growth Rates and Grain Sizes
- (2008) Paul W. May et al. Journal of Physical Chemistry C
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