期刊
THIN SOLID FILMS
卷 600, 期 -, 页码 43-52出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2016.01.011
关键词
Atmospheric Pressure; Plasma-Enhanced Chemical Vapor Deposition; Microwave Plasma Torch; Titanium Dioxide; Thin Film; Microstructure
类别
资金
- French Ministry for Higher Education and Research
In this study, a microwave plasma torch working at atmospheric pressure has been used for TiO2 thin film synthesis. We first optimised the deposition conditions in order to avoid the formation of powder in the plasma phase. Then, the characterisation of the TiO2 films deposited in the optimised conditions revealed that both morphology and phase structure of the film are radial dependent. At the centre, the film is crystallised, exhibiting a well-defined columnar microstructure. Meanwhile, at the periphery, the film is amorphous, with a cauliflower-like structure. (C) 2016 Elsevier B.V. All rights reserved.
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