Effect of nitrogen partial pressure on the TCR of magnetron sputtered indium tin oxide thin films at high temperatures

标题
Effect of nitrogen partial pressure on the TCR of magnetron sputtered indium tin oxide thin films at high temperatures
作者
关键词
Nitrogen partial pressure, ITO, TCR, High temperature
出版物
CERAMICS INTERNATIONAL
Volume -, Issue -, Pages -
出版商
Elsevier BV
发表日期
2022-01-20
DOI
10.1016/j.ceramint.2022.01.165

向作者/读者发起求助以获取更多资源

Reprint

联系作者

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search