The effect of TEOS plasma parameters on the silicon dioxide deposition mechanisms

标题
The effect of TEOS plasma parameters on the silicon dioxide deposition mechanisms
作者
关键词
-
出版物
JOURNAL OF NON-CRYSTALLINE SOLIDS
Volume 368, Issue -, Pages 86-92
出版商
Elsevier BV
发表日期
2013-04-03
DOI
10.1016/j.jnoncrysol.2013.03.008

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