Comparative studies on ferroelectric switching kinetics of sputtered Hf0.5Zr0.5O2 thin films with variations in film thickness and crystallinity
出版年份 2020 全文链接
标题
Comparative studies on ferroelectric switching kinetics of sputtered Hf0.5Zr0.5O2 thin films with variations in film thickness and crystallinity
作者
关键词
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出版物
JOURNAL OF APPLIED PHYSICS
Volume 128, Issue 7, Pages 074102
出版商
AIP Publishing
发表日期
2020-08-20
DOI
10.1063/5.0013487
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