High Mobility MoS2Transistor with Low Schottky Barrier Contact by Using Atomic Thick h-BN as a Tunneling Layer

标题
High Mobility MoS2Transistor with Low Schottky Barrier Contact by Using Atomic Thick h-BN as a Tunneling Layer
作者
关键词
-
出版物
ADVANCED MATERIALS
Volume 28, Issue 37, Pages 8302-8308
出版商
Wiley
发表日期
2016-07-08
DOI
10.1002/adma.201602757

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