Enhanced capacitive property of HfN film electrode by plasma etching for supercapacitors

出版年份 2018 全文链接

标题

作者

关键词

HfN thin films, Physical vapour deposition, Plasma etching, Supercapacitor, Electrochemical properties

出版物

Volume 235, Issue -, Pages 148-152

出版商

Elsevier BV

发表日期

2018-10-08

DOI

10.1016/j.matlet.2018.10.032

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