Localization effect of a current-path in amorphous In–Ga–Zn–O thin film transistors with a highly doped buried-layer

标题
Localization effect of a current-path in amorphous In–Ga–Zn–O thin film transistors with a highly doped buried-layer
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 519, Issue 13, Pages 4347-4350
出版商
Elsevier BV
发表日期
2011-02-26
DOI
10.1016/j.tsf.2011.02.033

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