Properties of atomic layer deposited HfO2 thin films

标题
Properties of atomic layer deposited HfO2 thin films
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 517, Issue 24, Pages 6576-6583
出版商
Elsevier BV
发表日期
2009-04-20
DOI
10.1016/j.tsf.2009.04.033

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