Significant Enhancement of the Dielectric Constant through the Doping of CeO2into HfO2by Atomic Layer Deposition

Electronic Structure of Cerium Oxide Gate Dielectric Grown by Plasma-Enhanced Atomic Layer Deposition

(2011) Woo-Hee Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer

(2010) W. J. Maeng et al.   APPLIED PHYSICS LETTERS

Dielectric properties of Er−doped HfO2 (Er∼15%) grown by atomic layer deposition for high-κ gate stacks

(2010) C. Wiemer et al.   APPLIED PHYSICS LETTERS

Atomic Layer Deposition of Gd-Doped HfO[sub 2] Thin Films

(2010) C. Adelmann et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition

(2010) Woo-Hee Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition

(2010) Woo-Hee Kim et al.   THIN SOLID FILMS

Permittivity enhancement of hafnium dioxide high-κ films by cerium doping

(2008) P. R. Chalker et al.   APPLIED PHYSICS LETTERS

The effect of dopants on the dielectric constant of HfO[sub 2] and ZrO[sub 2] from first principles

(2008) Dominik Fischer et al.   APPLIED PHYSICS LETTERS

Applications of atomic layer deposition to nanofabrication and emerging nanodevices

(2008) Hyungjun Kim et al.   THIN SOLID FILMS