Depth profiling of Fe-implanted Si(100) by means of X-ray reflectivity and extremely asymmetric X-ray diffraction

标题
Depth profiling of Fe-implanted Si(100) by means of X-ray reflectivity and extremely asymmetric X-ray diffraction
作者
关键词
-
出版物
JOURNAL OF APPLIED CRYSTALLOGRAPHY
Volume 46, Issue 2, Pages 505-511
出版商
International Union of Crystallography (IUCr)
发表日期
2013-03-13
DOI
10.1107/s0021889813004597

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