期刊
EUROPEAN POLYMER JOURNAL
卷 47, 期 11, 页码 2033-2052出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.eurpolymj.2011.07.025
关键词
Polymer resists; Conventional lithography; Alternative lithography; Patterning; Colloidal assembly; Nanoimprint lithography
This review provides a survey of lithography techniques and the resist materials employed with these techniques. The first part focuses on the conventional lithography methods used to fabricate complex micro- and nano-structured surfaces. In the second part, emphasis is placed on patterning with unconventional lithography techniques such as printing, molding, and embossing, and on their development into viable, high-resolution patterning technologies. (C) 2011 Elsevier Ltd. All rights reserved.
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