期刊
JOURNAL OF MATERIALS SCIENCE
卷 50, 期 8, 页码 3252-3257出版社
SPRINGER
DOI: 10.1007/s10853-015-8893-4
关键词
-
资金
- National Natural Science Foundation of China [51072102]
Sn-doped gallium oxide (Ga2O3:Sn) films were deposited on beta-Ga2O3 (100) substrates by metal organic chemical vapor deposition method. The Sn concentration was varied from 1 to 12 % (atomic ratio). The influences of Sn-doping concentration on structure, raman, and photoelectric properties of the films were investigated in detail. The obtained films were monoclinic beta-Ga2O3 homoepitaxial films. A decrease of about eight orders of magnitude in the film resistivity could be achieved through Sn doping. The 10 % Sn-doped film exhibited the best electrical properties and the lowest resistivity of about 1.20 x 10(-1) Omega cm, with the hall mobility value of 12.03 cm(2) V-1 s(-1)obtained. The average transmittances of the beta-Ga2O3: Sn films in the visible and UV wavelength ranges were all over 85 %. The optical band gap of the films with different Sn-doping concentrations could be modulated from 4.16 to 4.69 eV.
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