Optimization of the plasma oxidation and abrasive polishing processes in plasma-assisted polishing for highly effective planarization of 4H-SiC

出版年份 2014 全文链接

标题

作者

关键词

出版物

Volume 63, Issue 1, Pages 529-532

出版商

Elsevier BV

发表日期

2014-04-14

DOI

10.1016/j.cirp.2014.03.043

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