Effect of Post-Annealing on Microstructural and Electrical Properties of N+ Ion-Implanted into ZnO:In Films

标题
Effect of Post-Annealing on Microstructural and Electrical Properties of N+ Ion-Implanted into ZnO:In Films
作者
关键词
-
出版物
CHINESE PHYSICS LETTERS
Volume 25, Issue 3, Pages 1128-1130
出版商
IOP Publishing
发表日期
2008-03-08
DOI
10.1088/0256-307x/25/3/087

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