Influence of substrate annealing on inducing Ti3+ and oxygen vacancy in TiO2 thin films deposited via RF magnetron sputtering

标题
Influence of substrate annealing on inducing Ti3+ and oxygen vacancy in TiO2 thin films deposited via RF magnetron sputtering
作者
关键词
-
出版物
APPLIED SURFACE SCIENCE
Volume 462, Issue -, Pages 575-582
出版商
Elsevier BV
发表日期
2018-08-18
DOI
10.1016/j.apsusc.2018.08.137

向作者/读者发起求助以获取更多资源

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now