期刊
APPLIED SURFACE SCIENCE
卷 258, 期 9, 页码 4103-4111出版社
ELSEVIER
DOI: 10.1016/j.apsusc.2011.11.074
关键词
Nanofabrication; ITRS Roadmap; Self-assembly; Lithography; Focused-ion-beam; Ion-implantation
This review discusses some of the issues that will govern future commercial adoption of ion beam nanoscale fabrication and lithography, with special reference to some major fields of application. Selected recent research advances are highlighted, as they indicate new experimental successes, new insights into complex ion interaction mechanisms, and a fast evolving variety of advanced instrumentation and fabrication resources. It is evident that robust fabrication involving few-nanometer features will be enabled by strategic applications of ion beams, especially if they can be coupled with directed self-assembly. (C) 2011 Elsevier B. V. All rights reserved.
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