4.6 Article

Hydrogen in InN: A ubiquitous phenomenon in molecular beam epitaxy grown material

期刊

APPLIED PHYSICS LETTERS
卷 96, 期 8, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3327333

关键词

annealing; dislocation density; doping profiles; hydrogen; III-V semiconductors; impurities; indium compounds; molecular beam epitaxial growth; semiconductor doping; semiconductor epitaxial layers; semiconductor growth; surface contamination; wide band gap semiconductors

资金

  1. FCT Portuga [PTDC/FIS/100448/2008]
  2. program Ciencia
  3. Swedish Research Council [2005-5054]
  4. NSF MRSEC [DMR-0820521]
  5. U.S. Army Research Office [W911NF-08-C-0111]

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We study the unintentional H impurities in relation to the free electron properties of state-of-the-art InN films grown by molecular beam epitaxy (MBE). Enhanced concentrations of H are revealed in the near surface regions of the films, indicating postgrowth surface contamination by H. The near surface hydrogen could not be removed upon thermal annealing and may have significant implications for the surface and bulk free electron properties of InN. The bulk free electron concentrations were found to scale with the bulk H concentrations while no distinct correlation with dislocation density could be inferred, indicating a major role of hydrogen for the unintentional conductivity in MBE InN.

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