期刊
APPLIED PHYSICS LETTERS
卷 93, 期 20, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.2998541
关键词
holography; honeycomb structures; nanocomposites; nanotechnology; photolithography; polymerisation; silicon compounds; sputter etching
资金
- US Air Force Office for Scientific Research
- National Basic Research Program (973) of China [2004CB719800]
We report on the fabrication of nanoparticle/polymer submicron structures by combining holographic lithography and reactive ion etching. Silica nanoparticles are uniformly dispersed in a (SU8) polymer matrix at a high concentration, and in situ polymerization (cross-linking) is used to form a nanoparticle/polymer composite. Another photosensitive SU8 layer cast upon the nanoparticle/SU8 composite layer is structured through holographic lithography, whose pattern is finally transferred to the nanoparticle/SU8 layer by the reactive ion etching process. Honeycomb structures in a submicron scale are experimentally realized in the nanoparticle/SU8 composite.
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