期刊
ADVANCED MATERIALS
卷 21, 期 5, 页码 555-+出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200702484
关键词
-
Inorganic condensing sol-gel films are promising resist materials for nanoimprint lithography. We demonstrate that sequential patterning of these materials can be performed by controlling their condensation state. As a consequence, multilevel inorganic patterns can be obtained by superimposing structures, as show here, where successive stamping of a line pattern leads to two-level square features.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据