A Design for Selective Wet Etching of Si 3 N 4 /SiO 2 in Phosphoric Acid Using a Single Wafer Processor

标题
A Design for Selective Wet Etching of Si 3 N 4 /SiO 2 in Phosphoric Acid Using a Single Wafer Processor
作者
关键词
-
出版物
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 165, Issue 4, Pages H3187-H3191
出版商
The Electrochemical Society
发表日期
2018-03-22
DOI
10.1149/2.0281804jes

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