4.6 Article

226 nm AlGaN/AlN UV LEDs using p-type Si for hole injection and UV reflection

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APPLIED PHYSICS LETTERS
卷 113, 期 1, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.5038044

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  1. Defense Advanced Research Projects Agency (DARPA) [HR0011-15-2-0002]

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Deep ultraviolet (UV) light-emitting diodes (LEDs) at a wavelength of 226 nm based on AlGaN/AlN multiple quantum wells using p-type Si as both the hole supplier and the reflective layer are demonstrated. In addition to the description of the hole transport mechanism that allows hole injection from p-type Si into the wide bandgap device, the details of the LED structure which take advantage of the p-type Si layer as a reflective layer to enhance light extraction efficiency (LEE) are elaborated. Fabricated LEDs were characterized both electrically and optically. Owing to the efficient hole injection and enhanced LEE using the p-type Si nanomembranes (NMs), an optical output power of 225 mu W was observed at 20mA continuous current operation (equivalent current density of 15 A/cm(2)) without external thermal management. The corresponding external quantum efficiency is 0.2%, higher than any UV LEDs with emission wavelength below 230 nm in the continuous current drive mode. The study demonstrates that adopting p-type Si NMs as both the hole injector and the reflective mirror can enable high-performance UV LEDs with emission wavelengths, output power levels, and efficiencies that were previously inaccessible using conventional p-i-n structures. Published by AIP Publishing.

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