Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale

标题
Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale
作者
关键词
-
出版物
NANO LETTERS
Volume 17, Issue 8, Pages 4562-4567
出版商
American Chemical Society (ACS)
发表日期
2017-04-19
DOI
10.1021/acs.nanolett.7b00514

向作者/读者发起求助以获取更多资源

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now