4.4 Article

Fast growth rate of epitaxial β-Ga2O3 by close coupled showerhead MOCVD

期刊

JOURNAL OF CRYSTAL GROWTH
卷 475, 期 -, 页码 77-82

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2017.06.001

关键词

beta-Ga2O3 thin films; Growth rate; Metal organic chemical vapor deposition; X-ray diffraction; UV/Visible transmission

资金

  1. US Office of Naval Research (ONR) [N00014-16-P-2058]
  2. ONR

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We report on the growth of epitaxial beta-Ga2O3 thin films on c-plane sapphire substrates using a close coupled showerhead MOCVD reactor. Ga(DPM)(3) (DPM = dipivaloylmethanate), triethylgallium (TEGa) and trimethylgallium (TMGa) metal organic (MO) precursors were used as Ga sources and molecular oxygen was used for oxidation. Films grown from each of the Ga sources had high growth rates, with up to 10 mu m/hr achieved using a TMGa precursor at a substrate temperature of 900 degrees C. As confirmed by X-ray diffraction, the films grown from each of the Ga sources were the monoclinic ((2) over bar 01) oriented beta-Ga2O3 phase. The optical bandgap of the films was also estimated to be similar to 4.9 eV. The fast growth rate of beta-Ga2O3 thin films obtained using various Ga-precursors has been achieved due to the close couple showerhead design of the MOCVD reactor as well as the separate injection of oxygen and MO precursors, preventing the premature oxidation of the MO sources. These results suggest a pathway to overcoming the long-standing challenge of realizing fast growth rates for Ga2O3 using the MOCVD method. (C) 2017 Elsevier B.V. All rights reserved.

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