4.6 Article

Intrinsic electrical transport and performance projections of synthetic monolayer MoS2 devices

期刊

2D MATERIALS
卷 4, 期 1, 页码 -

出版社

IOP PUBLISHING LTD
DOI: 10.1088/2053-1583/4/1/011009

关键词

MoS2; monolayer; transfer length method; effective mobility; current density

资金

  1. Air Force Office of Scientific Research (AFOSR) grant [FA9550-14-1-0251]
  2. National Science Foundation (NSF) EFRI 2-DARE grant [1542883]
  3. NCN-NEEDS program
  4. NSF [1227020-EEC, DGE-114747]
  5. Semiconductor Research Corporation (SRC)
  6. Systems on Nanoscale Information fabriCs (SONIC)
  7. MARCO
  8. DARPA
  9. Stanford SystemX Alliance
  10. Stanford Graduate Fellowship (SGF) program
  11. Directorate For Engineering
  12. Div Of Engineering Education and Centers [1227020] Funding Source: National Science Foundation
  13. Emerging Frontiers & Multidisciplinary Activities
  14. Directorate For Engineering [1542883] Funding Source: National Science Foundation

向作者/读者索取更多资源

Wedemonstrate monolayer. (1L) MoS2 grown by chemical vapor deposition (CVD) with transport properties comparable to those of the best exfoliated 1L devices over a wide range of carrier densities (up to similar to 10(13) cm(-2)) and temperatures (80-500 K). Transfer length measurements decouple the intrinsic material mobility from the contact resistance, at practical carrier densities (> 10(12) cm(-2)). We demonstrate the highest current density reported to date (similar to 270 mu A mu m(-1) or 44 MA cm(-2)) at 300 K for an 80 nmlong device from CVD-grown 1L MoS2. Using simulations, we discuss what improvements of 1L MoS2 are still required to meet technology roadmap requirements for low power and high performance applications. Such results are an important step towards large-area electronics based on 1L semiconductors.

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