4.8 Article

High Current Density in Monolayer MoS2 Doped by AlOx

期刊

ACS NANO
卷 15, 期 1, 页码 1587-1596

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsnano.0c09078

关键词

2D semiconductors; current density; doping; high-field; self-heating; MoS2; Al2O3

资金

  1. National Science Foundation (NSF) as part of National Nanotechnology Coordinated Infrastructure Award [ECCS-1542152]
  2. ASCENT, one of six centers in JUMP, a Semiconductor Research Corporation (SRC) program - DARPA
  3. Stanford SystemX Alliance
  4. NSF Graduate Research Fellowship [DGE-114747]
  5. Stanford Graduate Fellowship (SGF) program

向作者/读者索取更多资源

This study demonstrates a method of low-temperature substoichiometric AlOx doping for monolayer MoS2, achieving high carrier densities and low sheet resistance in transistors. The doped MoS2 devices approach several low-power transistor metrics required by the international technology roadmap, making them promising for future semiconductor applications.
Semiconductors require stable doping for applications in transistors, optoelectronics, and thermoelectrics. However, this has been challenging for two-dimensional (2D) materials, where existing approaches are either incompatible with conventional semiconductor processing or introduce time-dependent, hysteretic behavior. Here we show that low-temperature (<200 degrees C) substoichiometric AlOx provides a stable n-doping layer for monolayer MoS2, compatible with circuit integration. This approach achieves carrier densities >2 x 10(13) cm(-2), sheet resistance as low as similar to 7 k Omega/square, and good contact resistance similar to 480 Omega.mu m in transistors from monolayer MoS2 grown by chemical vapor deposition. We also reach record current density of nearly 700 mu A/mu m (>110 MA/cm(2)) along this three-atom-thick semiconductor while preserving transistor on/off current ratio >10(6). The maximum current is ultimately limited by self-heating (SH) and could exceed 1 mA/mu m with better device heat sinking. With their 0.1 nA/mu m off-current, such doped MoS2 devices approach several low-power transistor metrics required by the international technology roadmap.

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