Band Alignments of Atomic Layer Deposited ZrO 2 and HfO 2 High-k Dielectrics with (-201) β-Ga 2 O 3

标题
Band Alignments of Atomic Layer Deposited ZrO 2 and HfO 2 High-k Dielectrics with (-201) β-Ga 2 O 3
作者
关键词
-
出版物
ECS Journal of Solid State Science and Technology
Volume 6, Issue 2, Pages Q3052-Q3055
出版商
The Electrochemical Society
发表日期
2016-12-07
DOI
10.1149/2.0131702jss

向作者/读者发起求助以获取更多资源

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now