Effect of bias on the structure and properties of TiZrN thin films deposited by unbalanced magnetron sputtering

标题
Effect of bias on the structure and properties of TiZrN thin films deposited by unbalanced magnetron sputtering
作者
关键词
Titanium zirconium nitride, Hardness, Residual stress, Magnetron sputtering
出版物
THIN SOLID FILMS
Volume 618, Issue -, Pages 13-20
出版商
Elsevier BV
发表日期
2016-05-19
DOI
10.1016/j.tsf.2016.05.021

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