Mitigating challenges in aberration-corrected electron-beam lithography on electron-opaque substrates

出版年份 2023 全文链接

标题

Mitigating challenges in aberration-corrected electron-beam lithography on electron-opaque substrates

作者

关键词

-

出版物

NANOTECHNOLOGY

Volume -, Issue -, Pages -

出版商

IOP Publishing

发表日期

2023-11-03

DOI

10.1088/1361-6528/ad0908

向作者/读者发起求助以获取更多资源

Protocol

Reagent

Reprint

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

© Peeref 2019-2024. All rights reserved.