Effect of bias voltage on the growth of super-hard (AlCrTiVZr)N high-entropy alloy nitride films synthesized by high power impulse magnetron sputtering

The superior properties of CrN coatings prepared by high power pulsed reactive magnetron sputtering

(2020) Qian Li et al.   AIP Advances

Synthesis and characterization of super-hard AlCrTiVZr high-entropy alloy nitride films deposited by HiPIMS

(2020) Yi Xu et al.   APPLIED SURFACE SCIENCE

The effect of magnetic field configuration on structural and mechanical properties of TiN coatings deposited by HiPIMS and dcMS

(2020) Anas Ghailane et al.   SURFACE & COATINGS TECHNOLOGY

Improving the hardness of high entropy nitride (Cr0.35Al0.25Nb0.12Si0.08V0.20)N coatings via tuning substrate temperature and bias for anti-wear applications

(2020) Yu-Chia Lin et al.   SURFACE & COATINGS TECHNOLOGY

Tunable microstructures and morphology of zirconium films via an assist of magnetic field in HiPIMS for improved mechanical properties

(2019) Huan Luo et al.   SURFACE & COATINGS TECHNOLOGY

Effect of bias voltage on microstructure and optical properties of Al2O3 thin films prepared by twin targets reactive high power impulse magnetron sputtering

(2019) Guangxue Zhou et al.   VACUUM

Sand erosion resistance improvement and damage mechanism of TiAlN coating via the bias-graded voltage in FCVA deposition

(2019) Xin Cao et al.   SURFACE & COATINGS TECHNOLOGY

FeMnNiCoCr-based high entropy alloy coatings: Effect of nitrogen additions on microstructural development, mechanical properties and tribological performance

(2019) Chuhan Sha et al.   APPLIED SURFACE SCIENCE

Diffusion barrier with 30-fold improved performance using AlCrTaTiZrN high-entropy alloy

(2019) Pankaj Kumar et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Growth (AlCrNbSiTiV)N thin films on the interrupted turning and properties using DCMS and HIPIMS system

(2018) Kai-Sheng Chang et al.   APPLIED SURFACE SCIENCE

Effects of deposition parameters on the structure and mechanical properties of high-entropy alloy nitride films

(2018) T.H. Hsieh et al.   CURRENT APPLIED PHYSICS

Microstructural and electrochemical comparison between TiN coatings deposited through HIPIMS and DCMS techniques

(2018) Hasan Elmkhah et al.   JOURNAL OF ALLOYS AND COMPOUNDS

A brief review of high-entropy films

(2018) Xue Hui Yan et al.   MATERIALS CHEMISTRY AND PHYSICS

Breakthrough applications of high-entropy materials

(2018) Jien-Wei Yeh et al.   JOURNAL OF MATERIALS RESEARCH

Effect of target composition on the microstructural, mechanical, and corrosion properties of TiAlN thin films deposited by high-power impulse magnetron sputtering

(2018) Chi-Lung Chang et al.   SURFACE & COATINGS TECHNOLOGY

Effect of substrate bias on properties of HiPIMS deposited vanadium nitride films

(2018) H. Hajihoseini et al.   THIN SOLID FILMS

Thermal stability of AlCrTaTiZrMo-nitride high entropy film as a diffusion barrier for Cu metallization

(2018) Rongbin Li et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Structure and tribological behavior of (AlCrNbSiTiV)N film deposited using direct current magnetron sputtering and high power impulse magnetron sputtering

(2018) Chun-Hao Chang et al.   THIN SOLID FILMS

Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering

(2017) Andrea Dagmar Pajdarová et al.   JOURNAL OF APPLIED PHYSICS

Influences of target poisoning on the mechanical properties of TiCrBN thin films grown by a superimposed high power impulse and medium-frequency magnetron sputtering

(2017) Chi-Yu Lu et al.   SURFACE & COATINGS TECHNOLOGY

Surface characteristics for the Ti Al N coatings deposited by high power impulse magnetron sputtering technique at the different bias voltages

(2016) H. Elmkhah et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering

(2016) Dheerawan Boonyawan et al.   SURFACE & COATINGS TECHNOLOGY

The improvement of high power impulse magnetron sputtering performance by an external unbalanced magnetic field

(2016) Chunwei Li et al.   VACUUM

Effect of Frequency and Power of Bias Applied to Substrate on Plasma Property of Very-High-Frequency Magnetron Sputtering

(2015) Yi Liu et al.   PLASMA SCIENCE & TECHNOLOGY

Plasma property of inductively coupled discharge and substrate bias co-assisted very-high-frequency magnetron sputtering

(2015) Yi Liu et al.   THIN SOLID FILMS

Alloy Design Strategies and Future Trends in High-Entropy Alloys

(2013) Jien-Wei Yeh   JOM

Ion mass spectrometry investigations of the discharge during reactive high power pulsed and direct current magnetron sputtering of carbon in Ar and Ar/N2

(2012) S. Schmidt et al.   JOURNAL OF APPLIED PHYSICS

Effects of substrate bias on structure and mechanical properties of (TiVCrZrHf)N coatings

(2012) Du-Cheng Tsai et al.   SURFACE & COATINGS TECHNOLOGY

Effects of substrate temperature on the structure and mechanical properties of (TiVCrZrHf)N coatings

(2011) Shih-Chang Liang et al.   APPLIED SURFACE SCIENCE

The inverse Hall–Petch effect in nanocrystalline ZrN coatings

(2011) Z.B. Qi et al.   SURFACE & COATINGS TECHNOLOGY

Deposition rates of high power impulse magnetron sputtering: Physics and economics

(2010) André Anders   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

On the film density using high power impulse magnetron sputtering

(2010) Mattias Samuelsson et al.   SURFACE & COATINGS TECHNOLOGY

Structural and mechanical properties of multi-element (AlCrMoTaTiZr)Nx coatings by reactive magnetron sputtering

(2010) Keng-Hao Cheng et al.   THIN SOLID FILMS

Reactive deposition of Al–N coatings in Ar/N2 atmospheres using pulsed-DC or high power impulse magnetron sputtering discharges

(2010) A. Guillaumot et al.   VACUUM

High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

(2009) K. Sarakinos et al.   SURFACE & COATINGS TECHNOLOGY