4.3 Article

Amorphous Ga-Sn-O thin-film crosspoint-type spike-timing-dependent-plasticity device

期刊

出版社

IOP PUBLISHING LTD
DOI: 10.35848/1347-4065/ac0d15

关键词

Amorphous-metal-oxide-semiconductor (AOS); Ga-Sn-O (GTO); thin-film; crosspoint-type; spike-timing-dependent-plasticity (STDP); device

资金

  1. JSPS KAKENHI (C) [19K11876]
  2. Mitsubishi Foundation
  3. Support Center for Advanced Telecommunications Technology Research
  4. Yazaki Memorial Foundation for Science and Technology
  5. Telecommunications Advancement Foundation
  6. HighTech Research Center in Ryukoku University
  7. Laboratory for Materials and Structures in Tokyo Institute of Technology
  8. Research Institute of Electrical Communication in Tohoku University
  9. KOA Corporation
  10. ROHM CO., Ltd.
  11. Grants-in-Aid for Scientific Research [19K11876] Funding Source: KAKEN

向作者/读者索取更多资源

An amorphous Ga-Sn-O thin-film crosspoint-type STDP device has been developed, which is cost-effective and easily deposited, making it suitable for neuromorphic learning applications. The device exhibits symmetric STDP characteristics, controlled by the electric field during pulse application.
An amorphous Ga-Sn-O (alpha-GTO) thin-film crosspoint-type spike-timing-dependent- plasticity (STDP) device has been developed. The alpha-GTO thin-film consists of omnipresent elements, can be easily deposited, and is therefore inexpensive. The STDP is a promising learning rule for neuromorphic systems. In this study, first, an alpha-GTO thin-film crosspoint-type STDP device is fabricated. Next, simple spiking pulses are applied as pre- and post-synapse signals. Finally, a symmetric STDP characteristic is observed, which is due to whether the electric field becomes high during the pulse application. From the potential feasibilities, we would like you to investigate and apply it as a basic technology for AI electronics.

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