Improved Synaptic Device Properties of HfAlOx Dielectric on Highly Doped Silicon Substrate by Partial Reset Process
出版年份 2021 全文链接
标题
Improved Synaptic Device Properties of HfAlOx Dielectric on Highly Doped Silicon Substrate by Partial Reset Process
作者
关键词
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出版物
Metals
Volume 11, Issue 5, Pages 772
出版商
MDPI AG
发表日期
2021-05-10
DOI
10.3390/met11050772
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