Effect of heat treatment on electrical and surface properties of tungsten oxide thin films grown by HFCVD technique
出版年份 2020 全文链接
标题
Effect of heat treatment on electrical and surface properties of tungsten oxide thin films grown by HFCVD technique
作者
关键词
Tungsten oxide thin films, Heat treatment, Electrical resistivity, AFM, Raman spectroscopy, HFCVD
出版物
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Volume 122, Issue -, Pages 105506
出版商
Elsevier BV
发表日期
2020-10-13
DOI
10.1016/j.mssp.2020.105506
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